The coulomb gap and hopping conduction; applications to Fe3O4 and to amorphous silicon
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Glass properties and applications · Semiconductor materials and devices · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (11)
Show source-provided references
1. Mott · 1979
2. Knotek · Phys. Rev. · 1974 · B9 · 66410.1103/PhysRevB.9.664 ↗
3. Knotek · Phil. Mag. · 1977 · 35 · 11310.1080/14786437708232653 ↗
4. Pollak, M., this volume.
5. Mott · Phil. Mag. · 1976 · 34 · 66310.1080/14786437608223805 ↗
6. Mott · 1979
7. Efros · J. Phys. C · 1975 · 8 · 14910.1088/0022-3719/8/4/003 ↗
8. Lewis · Phys. Rev. · 1976 · B13 · 256510.1103/PhysRevB.13.2565 ↗
9. Kuipers · Phys. Rev. · 1976 · B14 · 140110.1103/PhysRevB.14.1401 ↗
10. Kuipers · J. de Physique · 1979 · C1 · 233
11. Graener, H., Rosenberg, Whall, T.E. and Jones, M.R.B., Phil. Mag. (in press).