journal article·1985-12

Low temperature deposition of amorphous silicon oxide and silicon nitride films

P.D. Richard, D.V. Tsu, G. Lucovsky, S.Y. Lin

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence · Thin-Film Transistor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (7)

Show source-provided references
1. Adams · Solid State Technol. · 1983 · 26 · 135
2. Lucovsky · J. Vac. Sci. Tech B · 1985 · 3 · 112210.1116/1.583066 ↗
3. Richard · J. Vac. Sci. Tech. A · 1985 · 3 · 86710.1116/1.573334 ↗
4. Longeway · J. Phys. Chem. · 1984 · 88 · 7310.1021/j150645a018 ↗
5. S.S. Chao et al., these proceedings.
6. D.V. Tsu, G. Lucovsky and M. Mantini, Phys. Rev. (in press).
7. R.J. Markunas, unpublished results