journal article·1991

Deposition and characterization of amorphous and micro-crystalline Si,C alloy thin films by a remote plasma-enhanced chemical-vapor deposition process - RPECVD

C. Wang, G. Lucovsky, R.J. Nemanich

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Ion-surface interactions and analysis · Diamond and Carbon-based Materials Research

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References (8)

Show source-provided references
1. LeComber · J. Non-Cryst. Solids · 1989 · 115 · 110.1016/0022-3093(89)90346-3 ↗
2. Hamakawa · J. Non-Cryst. Solids · 1989 · 11 · 18010.1016/0022-3093(89)90398-0 ↗
3. Parsons · J. Vac. Sci. Technol. · 1984 · A6 · 1912
4. Wang · 1990 · 192 · 535
5. Wang · J. Vac. Sci. Technol · 1991 · A9 · 44410.1116/1.577430 ↗
6. Wang · 1990 · 204
7. Lucovsky · 1991 · 219
8. Wang · 1991 · 219