Substrate temperature dependence of SiH concentration in silane plasmas for amorphous silicon film deposition
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Thin-Film Transistor Technologies · ZnO doping and properties · Diamond and Carbon-based Materials Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (21)
Show source-provided references
1. Kampas · J. Appl. Phys. · 1981 · 52 · 128510.1063/1.329752 ↗
2. Perrin · Chem. Phys. · 1982 · 67 · 16710.1016/0301-0104(82)85031-3 ↗
3. Hamasaki · J. de Phys. · 1981 · 42 · C4
4. Schmitt · Chem. Phys. · 1984 · 84 · 28110.1016/0301-0104(84)85213-1 ↗
5. Garscadden · 1986 · 68 · 127
6. Roth · Appl. Phys. Lett. · 1984 · 45 · 2810.1063/1.94992 ↗
7. Matsumi · 1985 · 69
8. Hata · Jpn. J. Appl. Phys. · 1983 · 22 · L110.1143/JJAP.22.L1 ↗
9. Hata · J. Non-Cryst. Solids · 1985 · 77 & 78 · 77710.1016/0022-3093(85)90775-6 ↗
10. Kushner · 1986 · 68 · 293
11. Knights · Jpn. J. Appl. Phys. · 1979 · 18 · 10110.7567/JJAPS.18S1.101 ↗
12. Hirose · Jpn. J. Appl. Phys. · 1981 · 21 · 275
13. Scott · J. Appl. Phys. · 1983 · 54 · 685310.1063/1.332008 ↗
14. Klynning · Arkiv Fysik · 1966 · 33 · 73
15. Bauer · Chem. Phys. Lett. · 1982 · 108 · 56010.1016/0009-2614(84)85054-X ↗
16. Kushner · J. Appl. Phys. · 1983 · 54 · 495810.1063/1.332763 ↗
17. Ohuchi · J. Phys. D: Appl. Phys. · 1983 · 16 · 170510.1088/0022-3727/16/9/016 ↗
18. Hagstrum · Phys. Rev. · 1956 · 104 · 151610.1103/PhysRev.104.1516 ↗
19. Redhead · 1962 · 334
20. Physisorption kinetics
21. Pennebaker · IBM J. Res. Develop. · 1979 · 23 · 1610.1147/rd.231.0016 ↗