journal article·1980-11

Properties of a-Si : H : F deposited in SiF4/SiH4/Ar Gas mixtures by a glow-discharge technique

S. Usui, A. Sawada, M. Kikuchi

Journal of Non-Crystalline Solids· Volume 41· Issue 2
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (7)

Show source-provided references
1. Ovshinsky · New Scientist · 1978 · 30 · 674
2. Ovshinsky · Nature · 1978 · 276 · 48210.1038/276482b0 ↗
3. Madan · Phil. Mag. · 1979 · B40 · 25910.1080/01418637908227166 ↗
4. Usui · J. Non-Crystalline Solids · 1979 · 34 · 110.1016/0022-3093(79)90002-4 ↗
5. Brodsky · Phys. Rev. · 1977 · B16 · 355610.1103/PhysRevB.16.3556 ↗
6. Staebler · Appl. Phys. Lett. · 1977 · 31 · 29210.1063/1.89674 ↗
7. Lucovsky · Solid St. Commun. · 1979 · 29 · 57110.1016/0038-1098(79)90666-5 ↗