journal article·1991

Challenges and confusions in the kinetics and mechanism of plasma induced deposition of a- and μc-Ge:H

S. Vepřek, F. Glatz, R. Konwitschny

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Ion-surface interactions and analysis · Silicon Nanostructures and Photoluminescence

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References (10)

Show source-provided references
1. Vepřek · Plasma Chem. Plasma Process. · 1990 · 10 · 310.1007/BF01460445 ↗
2. Vepřek · Appl. Phys. Lett. · 1990 · 56 · 176610.1063/1.103221 ↗
3. Vepřek · Plasma Chem. Plasma Process. · 1991 · 11 · 32310.1007/BF01458914 ↗
4. Vepřek · 1989 · 149 · 3
5. Vepřek · 1991 · 219
6. Karg · Solar Energy Materials · 1991
7. Paul · 1991 · 219
8. W. Kasper, et al, this conference and private communication (1991)
9. Street · Phys. Rev. · 1991 · B 43 · 245410.1103/PhysRevB.43.2454 ↗
10. Kikuchi · 1985