Hydrogen incorporation, doping and thickness dependent conductivity in glow discharge deposited a-Si:H films
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Transition Metal Oxide Nanomaterials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (10)
Show source-provided references
1. Ast · J. Non-Cryst. Solids · 1980 · 35&36 · 61110.1016/0022-3093(80)90662-6 ↗
2. Hasegawa · Phil. Mag. · 1982 · B46 · 23910.1080/13642818208246437 ↗
3. Knights · Solid State Comm. · 1977 · 22 · 13310.1016/0038-1098(77)90418-5 ↗
4. Jackson · Appl. Phys. Lett. · 1983 · 42 · 10510.1063/1.93762 ↗
5. Müller · Phil. Mag. · 1980 · B41 · 57110.1080/13642818008245406 ↗
6. Müller · Appl. Phys. · 1982 · A29 · 6310.1007/BF00632427 ↗
7. Kampas · Appl. Phys. Lett. · 1981 · 39 · 40710.1063/1.92754 ↗
8. Ley · J. Physique · 1981 · C4 · 753
9. Spear · Phil. Mag. · 1976 · 33 · 93510.1080/14786437608221926 ↗
10. Williams · J. Phys. · 1979 · C12 · 209