journal article·1980-01

Influence of oxygen and deposition conditions on sputtered a-Si

Tatsuo Shimizu, Minoru Kumeda, Ichiro Watanabe, Kiyohide Kamono

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and interfaces · Phase-change materials and chalcogenides

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (7)

Show source-provided references
1. Tsai · 1977 · 339
2. Moustakas · Solid State Commun. · 1977 · 23 · 15510.1016/0038-1098(77)90099-0 ↗
3. Fisch · Phys. Rev. Lett. · 1978 · 41 · 88910.1103/PhysRevLett.41.889 ↗
4. Pawlewicz · J. Appl. Phys. · 1978 · 49 · 559510.1063/1.324481 ↗
5. Shimizu · Jpn. J. Appl. Phys. · 1979 · 1810.1143/JJAP.18.1923 ↗
6. Kaiser · Phys. Rev. · 1956 · 101 · 126410.1103/PhysRev.101.1264 ↗
7. Ohgawara · Kagaku no Ryoiki extra no. 45 · 1961 · 127