journal article·1980-01

Theory of radiative recombination by diffusion and tunnelling in amorphous Si:H

J. Noolandi, K.M. Hong, R.A. Street

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Silicon Nanostructures and Photoluminescence · Glass properties and applications · Thin-Film Transistor Technologies

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References (10)

Show source-provided references
1. Engemann · Phys. Status Solidi B · 1977 · 79 · 19510.1002/pssb.2220790120 ↗
2. Pankove · Appl. Phys. Lett. · 1976 · 29 · 62010.1063/1.89165 ↗
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4. Street · Phys. Rev. B · 1978 · 18 · 188010.1103/PhysRevB.18.1880 ↗
5. Tsang · Phys. Rev. B · 1979 · 19 · 302710.1103/PhysRevB.19.3027 ↗
6. K.M. Hong, J. Noolandi, and R.A. Street, to be published.
7. Fabrikant · J. Lumin · 1975 · 9 · 50210.1016/0022-2313(75)90064-2 ↗
8. Mozumder · J. Chem. Phys. · 1968 · 48 · 165910.1063/1.1668892 ↗
9. Pai · Phys. Rev. B · 1975 · 11 · 516310.1103/PhysRevB.11.5163 ↗
10. Anderson · Phil. Mag. · 1977 · 36 · 69510.1080/14786437708239749 ↗