Influence of the plasma parameters on the properties of a-Si films prepared by glow-discharge deposition method
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Transition Metal Oxide Nanomaterials
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References (9)
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1. Bahl · J. of Non-Crys.-Solids · 1975 · 17 · 40910.1016/0022-3093(75)90130-1 ↗
2. Brodsky · Thin Solid Films · 1977 · 40 · L2310.1016/0040-6090(77)90095-5 ↗
3. Brodsky · Phys. Rew. · 1977 · B16 · 355610.1103/PhysRevB.16.3556 ↗
4. Chittick · J. of Non-Crys.-Solids · 1970 · 3 · 25510.1016/0022-3093(70)90181-X ↗
5. Kocian · J. de Physique · 1979 · 40 · 169
6. Kocian · 1979
7. Le Comber · 1973 · 243
8. Lucovsky · Phys. Rew. · 1979 · 19B · 206410.1103/PhysRevB.19.2064 ↗
9. Zanzucchi · J. Appl. Phys. · 1977 · 48 · 522710.1063/1.323553 ↗