journal article·1993-12

The effects of Ar and He dilution of silane plasmas on the microstructure of a-Si:H detected by small-angle X-ray scattering

S.J. Jones, Y. Chen, D.L. Williamson, U. Kroll, P. Roca i Cabarrocas

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Silicon Nanostructures and Photoluminescence

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References (12)

Show source-provided references
1. Finger · J. Appl. Phys. · 1992 · 71 · 566510.1063/1.350500 ↗
2. Roca i Cabarrocas · Phil. Mag. B · 1992 · 65 · 102510.1080/13642819208217918 ↗
3. Williamson · Appl. Phys. Lett. · 1989 · 55 · 78310.1063/1.101779 ↗
4. Kroll · 1992 · 258 · 135
5. Diffraction from Materials
6. Diffraction from Materials
7. Knights · Appl. Phys. Lett. · 1981 · 38 · 33110.1063/1.92359 ↗
8. Jones · Appl. Phys. Lett. · 1993 · 62 · 326710.1063/1.109095 ↗
9. Mahan · Appl. Phys. Lett. · 1987 · 50 · 33510.1063/1.98192 ↗
10. Jones · 1993
11. J.P. Kleider, C. Longeaud and P. Roca i Cabarrocas, this conference.
12. Guha · Appl. Phys. Lett. · 1992 · 61 · 144410.1063/1.107564 ↗