journal article·1989-12

Hydrogen dilution effects on properties of ECR plasma deposited a-Ge:H

Takeshi Aoki, Seiichi Kato, Yasuo Nishikawa, Masataka Hirose

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Photonic and Optical Devices · Semiconductor Lasers and Optical Devices

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References (7)

Show source-provided references
1. Aoki · Jpn. J. Appl. Phys. · 1989 · 28 · 84910.1143/JJAP.28.849 ↗
2. Matsuda · J. Non-Cryst. Solids · 1987 · 97 & 98 · 136710.1016/0022-3093(87)90328-0 ↗
3. Shibata · Jpn. J. Appl. Phys. · 1986 · 25 · L54010.1143/JJAP.25.L540 ↗
4. Moustakas · J. Appl. Phys. · 1976 · 47 · 132210.1063/1.322834 ↗
5. Drevillon · Appl. Phys. Lett. · 1983 · 42 · 80110.1063/1.94100 ↗
6. Sputtering
7. Matsuda · Jpn. J. Appl. Phys. · 1986 · 25 · L5410.1143/JJAP.25.L54 ↗