journal article·1993-12

Control of a-Si:H deposition by the ion flux in a VHF plasma

M. Heintze, R. Zedlitz

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Plasma Diagnostics and Applications · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (11)

Show source-provided references
1. Curtins · 1987 · 7 · 267
2. Moisan · J. Vac. Sci. Technol. · 1991 · B9 · 810.1116/1.585795 ↗
3. Ferreira · J. Phys. D: Appl. Phys. · 1984 · 17 · 117510.1088/0022-3727/17/6/014 ↗
4. Howling · J. Vac. Sci. Technol. · 1992 · A10 · 108010.1116/1.578205 ↗
5. Surendra · Appl. Phys. Lett. · 1991 · 59 · 209110.1063/1.106112 ↗
6. Heintze · 1993 · 297
7. Zedlitz · Mater. Res. Soc. Symp Proc. · 1992 · 258 · 14710.1557/PROC-258-147 ↗
8. Beneking · 1993 · 586
9. Vepřek · 1993 · 297
10. Howling · J. Phys. D: Appl. Phys. · 1993 · 26 · 100310.1088/0022-3727/26/6/019 ↗
11. Vepřek · J. Vac. Sci. Technol. · 1989 · A7 · 261410.1116/1.575806 ↗