journal article·1998-05

a-Si:H deposited at high rate on the cathode of a rf-PECVD reactor

Stephan Will, Helmut Mell, Margarethe Poschenrieder, Walther Fuhs

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

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References (18)

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