journal article·1996-07

Characteristics of amorphous silicon precipitated by means of argon excimer laser irradiation on SiC films

M. Ohmukai, H. Naito, M. Okuda, K. Kurosawa

Journal of Non-Crystalline Solids· Volume 202· Issue 1-2
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · High-Temperature Coating Behaviors · Advanced Surface Polishing Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (9)

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4. Ohmukai · Jpn. J. Appl. Phys. · 1992 · 31 · L69610.1143/JJAP.31.L696 ↗
5. Wakita · Photographic Sci. Eng. · 1982 · 26 · 183
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7. Powder Diffraction File by JCPDS.
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9. Smith · Phys. Rev. Lett. · 1971 · 26 · 64210.1103/PhysRevLett.26.642 ↗