Characteristics of amorphous silicon precipitated by means of argon excimer laser irradiation on SiC films
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Abstract
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · High-Temperature Coating Behaviors · Advanced Surface Polishing Techniques
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References (9)
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1. Sasaki · 1988 · 316
2. Kurosawa · Rev. Sci. Instrum. · 1990 · 61 · 72810.1063/1.1141485 ↗
3. Kurosawa · Jpn. J. Appl. Phys. · 1991 · 30 · 321910.1143/JJAP.30.3219 ↗
4. Ohmukai · Jpn. J. Appl. Phys. · 1992 · 31 · L69610.1143/JJAP.31.L696 ↗
5. Wakita · Photographic Sci. Eng. · 1982 · 26 · 183
6. 1982
7. Powder Diffraction File by JCPDS.
8. Feldman · Phys. Rev. · 1968 · 173 · 78710.1103/PhysRev.173.787 ↗
9. Smith · Phys. Rev. Lett. · 1971 · 26 · 64210.1103/PhysRevLett.26.642 ↗