Effect of pressure on photo-induced expansion of As0.2Se0.8 layer

Abstract The effect of hydrostatic pressure on photo-induced surface expansion in As0.2Se0.8 thin films has been studied in the pressure range of 0–0.5 GPa. The development of the surface relief was investigated at different intensities and exposure of laser irradiation. We have observed that the applied pressure suppressed the rate of the surface relief formation, therefore the pressure dependent components of the structural transformations in glasses should be included to the model of this phenomenon.