The influence of carbon addition on the internal stress and chemical inertness of amorphous silicon-nitride films
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Abstract
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence
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References (13)
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10. Electron Beam Microanalysis
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13. Martin · J. Vac. Sci. Technol. · 1985 · A3 · 61510.1116/1.572963 ↗