journal article·2008-05Open access

Quantum efficiency measurement of n–i–p a-Si:H photodiode array on CMOS circuit for positron emission tomography (PET)

A. Nardulli, M. Despeisse, G. Dissertori, S. Dunand, P. Jarron, W. Lustermann, D. Moraes, D. Schinzel, N. Wyrsch

Journal of Non-Crystalline Solids· Volume 354· Issue 19-25

Abstract

Detection of scintillation light from LSO (Lutetiumoxyorthosilicate) crystals used in positron emission tomography (PET) is traditionally based on photo- multipliers. The proposal is to develop a novel photo- sensor, which is based on vertically integrating an hydrogenated amorphous silicon (a-Si:H) film on a pixel readout chip. The a-Si:H film is deposited with a n-i-p diode structure. The ASIC (Application Specific Integrated Circuit) performs both signal amplification and readout processing. The advantage of such an approach is the extremely compact and low-cost design, together with ultra- low noise signal retrieval. In addition the a-Si:H offers the technological advantage of direct deposition on the wafer thanks to the low deposition temperature. The article presents the results of quantum efficiency measured on different types of a-Si:H photodiodes deposited on glass (DC measurement) and CMOS circuit (AC measurement). Quantum Efficiency (QE) up to 80% has been measured at the wavelength of interest for the optimized photodiodes. © 2007 Elsevier B.V. All rights reserved.
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Research context

OpenAlex topics: Thin-Film Transistor Technologies · CCD and CMOS Imaging Sensors · Transition Metal Oxide Nanomaterials

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