Catalytic chemical vapor deposition method to obtain high quality amorphous silicon and silicon-germanium
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Abstract
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices
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References (5)
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1. Matsumura · 1985 · 1277
2. Matsumura · Jpn. J. Appl. Phys. · 1986 · 25 · 94910.1143/JJAP.25.L949 ↗
3. Spear · Philos. Mag. · 1976 · B-40 · 93510.1080/14786437608221926 ↗
4. Matsuda · Jpn. J. Appl. Phys. · 1986 · 25 · 5410.1143/JJAP.25.L54 ↗
5. Watanabe · Jpn. J. Appl. Phys. · 1987 · 26 · 28810.1143/JJAP.26.L288 ↗