Boron diffusion in amorphous silicon analized by SIMS and temperature dependent conductivity
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Ion-surface interactions and analysis · Silicon and Solar Cell Technologies · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (8)
Show source-provided references
1. Carlson · Appl. Phys. Lett. · 1978 · 33 · 8110.1063/1.90153 ↗
2. Ziegler · J. Appl. Phys. · 1972 · 43 · 380910.1063/1.1661816 ↗
3. Elliman · Appl. Phys. Lett. · 1985 · 46 · 47810.1063/1.95563 ↗
4. Zemek · Sol. En. Mat. · 1984 · 11 · 31110.1016/0165-1633(84)90049-2 ↗
5. Bilger · Thin Solid Films · 1984 · 119 · 10310.1016/0040-6090(84)90162-7 ↗
6. Sputtering of Multicomponent Mat.
7. General features of diffusion in semiconductors
8. Sputtering by ion bombardment