journal article·1998-05

Improvements in stability of amorphous silicon solar cells by using ECR-CVD processing

Vikram L. Dalal, Tim Maxson, Kay Han, Sohail Haroon

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Electrostatic Discharge in Electronics

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References (10)

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2. V.L. Dalal, B. Moradi, G. Baldwin, in: B. Stafford (Ed.), Proc. of Am. Inst. of Phys., Vol. 234, 1991, p. 298.10.1063/1.41040 ↗
3. Dalal · J. Non-Cryst. Solids · 1993 · 71 · 164
4. Dalal · Appl. Phys. Lett. · 1994 · 64 · 186210.1063/1.111780 ↗
5. Mahan · J. Appl. Phys. · 1991 · 69 · 672910.1063/1.348897 ↗
6. Shirai · Appl. Phys. Lett. · 1991 · 26 · 109610.1063/1.106355 ↗
7. Dalal · J. Non-Cryst. Solids · 1996 · 1101 · 198
8. McCaughey · J. Appl. Phys. · 1989 · 65 · 18610.1063/1.342568 ↗
9. C.C. Tsai, in: H. Fritzsche (Ed.), Amorphous Si and Related Materials, World Scientific, Singapore, Vol. 1, 1989, p. 123.10.1142/9789814434157_0006 ↗
10. V.L. Dalal, M. Leonard, J. Booker, A. Vaseashta, Proc. of 18th IEEE Photovoltaic Specialist Conf., 1985, p. 847.