journal article·1992

Silicon nitride films deposited by Hg-photosensitization chemical vapor deposition

M. Lemiti, S. Audisio, J.C. Dupuy, B. Balland

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · ZnO doping and properties

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References (17)

Show source-provided references
1. Collet · J. Electrochem.Soc. · 1969 · 116 · 11010.1149/1.2411718 ↗
2. Hamano · Jpn. J. Appl. Phys. · 1984 · 23 · 120910.1143/JJAP.23.1209 ↗
3. Kamimura · Tech. Digest of the Int. PVSEC-3 · 1987 · 557
4. Claasen · J. Electrochem. Soc. · 1983 · 130 · 241910.1149/1.2119600 ↗
5. Numazawa · Jpn. J. Appl. Phys. · 1983 · 22 · L79210.1143/JJAP.22.L792 ↗
6. Fuyuki · J. Appl. Phys. · 1990 · 68 · 332210.1063/1.346385 ↗
7. Padmabhan · J. Vac. Sci. Technol. · 1986 · A4 · 36310.1116/1.573929 ↗
8. Allain · Appl. Surf. Sci. · 1989 · 36 · 20510.1016/0169-4332(89)90915-X ↗
9. Bauer · Phys. Status Solidi · 1974 · 26 · 57910.1002/pssa.2210260222 ↗
10. Do Thanh · J. Electron. Mater. · 1988 · 17 · 15510.1007/BF02652146 ↗
11. Balland · J. Electrochem. Soc. · 1990 · 1237 · 284510.1149/1.2087085 ↗
12. Lemiti · 1991 · Vol. 2 · 1002
13. Wilson · 1989
14. Tamagawa · Jpn. J. Appl. Phys. · 1986 · 25 · L72810.1143/JJAP.25.L728 ↗
15. Hesto · 1986 · Vol. 1
16. Chow · J. Appl. Phys. · 1982 · 53 · 563010.1063/1.331445 ↗
17. Klausmann · 1986 · Vol. 2