Annealing effect on photoluminescence properties of Er doped Al2O3–SiO2 sol–gel films
Source abstract
Abstract
Abstract Annealing effect on photoluminescence intensity of Er doped Al 2 O 3 –SiO 2 prepared from Er doped boehmite (AlOOH) and GPS (3-glycidoxypropyltrimethoxysilane) hybrid was investigated. The emission intensities peaked at 1.54 μm, which correspond to the 4 I 13/2 → 4 I 15/2 transition of the Er 3+ ion, are greatly increased by about 8 times between 900 and 1000 °C, than that expected from TGA associated with the elimination of hydroxyl groups which is responsible for the fluorescence quenching. The residual hydroxyl groups for Er doped Al 2 O 3 –SiO 2 after annealing at high temperature was further analyzed by FT-IR. Finally, fluorescence intensities were compared with the variation of BET surface areas against the annealing temperature. It was found that photoluminescence intensity below 1000 °C was more dependent on surface hydroxyl groups re-adsorbed by a high specific surface area rather than internal hydroxyl groups remained in gel film.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Luminescence Properties of Advanced Materials · Glass properties and applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (16)
Show source-provided references
1. Tingye · IEEE Proc. · 1993 · 81 · 156810.1109/5.247728 ↗
2. Righini · Opt. Quantum Electron. · 2002 · 34 · 115110.1023/A:1021338906917 ↗
3. Orignac · Opt. Mater. · 1999 · 12 · 110.1016/S0925-3467(98)00076-7 ↗
4. Martucci · J. Sol–Gel Sci. Tech. · 1998 · 13 · 53510.1023/A:1008618621828 ↗
5. Schmidt · Chem. Mater. · 1998 · 10 · 6510.1021/cm9702169 ↗
6. Strohhofer · Thin Solid Films · 1998 · 326 · 9910.1016/S0040-6090(98)00535-5 ↗
7. Orignac · Appl. Phys. Lett. · 1996 · 69 · 89510.1063/1.117980 ↗
8. Selvarajan · IEEE J. Quantum Electron. · 2001 · 37 · 111710.1109/3.945316 ↗
9. Slooff · Appl. Phys. Rev. · 2002 · 91 · 395510.1063/1.1454190 ↗
10. Coutier · Thin Solid Films · 2001 · 392 · 4010.1016/S0040-6090(01)01017-3 ↗
11. Stone · J. Non-Cryst. Solids · 1996 · 197 · 13610.1016/0022-3093(95)00514-5 ↗
12. Kurokawa · Chem. Phys. Lett. · 1998 · 287 · 73710.1016/S0009-2614(98)00132-8 ↗
13. van den Hoven · Appl. Phys. Lett. · 1996 · 68 · 188610.1063/1.116283 ↗
14. Benatsou · J. Appl. Phys. Lett. · 1997 · 71 · 42810.1063/1.119569 ↗
15. Parler · J. Non-Cryst. Solids · 2001 · 279 · 11910.1016/S0022-3093(00)00401-4 ↗
16. Seok · J. Am. Ceram. Soc. · 2005 · 88 · 238010.1111/j.1551-2916.2005.00454.x ↗