An electron-spin-resonance study of laser crystallized polycrystalline silicon
Source abstract
Abstract
Abstract Electron states in phosphorus doped laser crystallized polycrystalline silicon are investigated employing electron-spin-resonance measurements. The spectra reveal two resonances: a defect resonance assigned to silicon dangling bonds ( g =2.0053) and the resonance due to conducting electrons ( g =1.998). The temperature dependence of the susceptibility of the latter resonance can be described by a sum of a Curie- and a Pauli-like paramagnetism. As the Curie contribution decreases with increasing doping concentration the Pauli contribution increases. The defect density as a function of the doping concentration is constant for low doping concentrations and decreases for values larger than 10 19 cm −3 . The results are discussed in terms of models developed for single crystal, amorphous and microcrystalline silicon.
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Laser Material Processing Techniques · Silicon Nanostructures and Photoluminescence
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References (12)
Show source-provided references
1. Christiansen · J. Appl. Phys. · 2001 · 86 · 534810.1063/1.1360703 ↗
2. Jackson · Appl. Phys. Lett. · 1983 · 43 · 19510.1063/1.94278 ↗
3. Johnson · Appl. Phys. Lett. · 1982 · 40 · 88210.1063/1.92934 ↗
4. Lips · J. Non-Cryst. Solids · 2002 · 299–302 · 35010.1016/S0022-3093(01)01011-0 ↗
5. Lengsfeld · Appl. Phys. Lett. · 2000 · 76 · 168010.1063/1.126134 ↗
6. Brendel · Sol. Stat. Phen. · 2003 · 93 · 16710.4028/www.scientific.net/SSP.93.167 ↗
7. Quirt · Phys. Rev. B · 1972 · 5 · 171610.1103/PhysRevB.5.1716 ↗
8. Ue · Phys. Rev. B · 1971 · 3 · 423210.1103/PhysRevB.3.4232 ↗
9. K. Brendel, N.H. Nickel, K. Lips, W. Fuhs, MRS Symp. Proc. 762 (2003) A2.3.110.1557/PROC-762-A2.3 ↗
10. Brendel · Sol. Stat. Comm. · 2003 · 126 · 49910.1016/S0038-1098(03)00279-5 ↗
11. Mikoshiba · Rev. Mod. Phys. · 1968 · 40 · 83310.1103/RevModPhys.40.833 ↗
12. Fuhs · J. Vac. Sci. Tech. · 2000 · 18 · 179210.1116/1.591473 ↗