journal article·1995-07

Hydrogen incorporation in silicon oxide films deposited by ArF laser-induced chemical vapor deposition

E.G. Parada, P. González, J. Serra, B. León, M. Pérez-Amor, M.F. da Silva, H. Wolters, J.C. Soares

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Abstract

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence

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References (18)

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