Low-temperature plasma-assisted oxidation of Si: a new approach for creation of device-quality SiSiO2 interfaces with deposited dielectrics for applications in Si MOSFET technologies
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Abstract
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OpenAlex topics: Semiconductor materials and devices · Advanced ceramic materials synthesis · Silicon Nanostructures and Photoluminescence
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References (15)
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15. Y. Ma and G. Lucovsky, unpublished results.