Polysilicon produced by excimer (ArF) laser crystallisation and low-temperature (600°C) furnace crystallisation of hydrogenated amorphous silicon (a-Si:H)
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies
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References (10)
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1. Brotherton · IEEE. Trans. Elect. Devices · 1993 · 40 · 40710.1109/16.182521 ↗
2. Bachrach · 1991
3. Mathé · Appl. Surf. Sci. · 1992 · 54 · 39210.1016/0169-4332(92)90077-B ↗
4. Sameshima · 1993 · 283 · 679
5. Carluccio · 1993 · 283 · 715
6. Dyer · 1993 · 283 · 691
7. Nakazawa · J. Appl. Phys. · 1990 · 68 · 102910.1063/1.346740 ↗
8. Harbeke · J. Electrochem. Soc. · 1990 · 137 · 69610.1149/1.2086534 ↗
9. Sameshima · J. Appl. Phys. · 1991 · 70 · 128110.1063/1.349584 ↗
10. Zanzucchi · 1984 · 21B