journal article·1998-05

1/f noise in a-Si1−xCx:H thin films as novel thermistor materials for micro-machined IR sensors

Tsutomu Ichihara, Kouichi Aizawa

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Electrical and Thermal Properties of Materials

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References (3)

Show source-provided references
1. W.E. Spear, P.G. LeComber, Philosophical Magazine, 1976, 935 pp.10.1080/14786437608221926 ↗
2. Excess noise sources10.1109/16.333808 ↗
3. Properties and structure of a-SiC:H for high-efficiency a-Si solar cell10.1063/1.331363 ↗