journal article·2006-06

Plasma diagnostics in silane–methane–hydrogen plasmas under pm-Si1−C :H deposition conditions: Correlation with film properties

V. Suendo, P. Roca i Cabarrocas

Journal of Non-Crystalline Solids· Volume 352· Issue 9-20
Publisher page

Abstract

A systematic study has been done on the formation of nanoparticles in silane-methane-hydrogen plasmas and their effect on material properties. By increasing the total pressure we cover three phases of particle growth: nanocrystals nucleation and accumulation, agglomeration, and powder formation. The presence of particles in the plasma is detected from the evolution of the discharge electrical parameters such as the self-bias (V DC ) on the radio-frequency electrode and the peak-to-peak RF voltage (V PP ). Interestingly, optical emission spectroscopy measurements show that the presence of particles has a strong effect on the hydrogen emission bands. Indeed, while H α emission is dominant at low pressure in a powder free discharge, the formation of particles leads to an intense H 2 Fulcher a band. Moreover the ratio I Fulcher /I Hα provides a clear signature of the transition from nucleation to agglomeration regimes, thus providing an easy way of characterizing the plasma regime. The changes in the deposition regime are also reflected on the film properties, in particular their photoluminescence characteristics.
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Research context

OpenAlex topics: Dust and Plasma Wave Phenomena · Silicon Nanostructures and Photoluminescence · Thin-Film Transistor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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