journal article·1988-06

Influence of different deposition parameters on the properties of hydrogenated amorphous silicon films prepared by magnetron sputtering

Debajyoti Das, Ratnabali Banerjee, A.K. Batabyal, A.K. Barua

Journal of Non-Crystalline Solids· Volume 103· Issue 1
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Transition Metal Oxide Nanomaterials · Silicon Nanostructures and Photoluminescence

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References (12)

Show source-provided references
1. Bhat · Phil. Mag. B · 1983 · 47 · L 9910.1080/01418638308228275 ↗
2. Gangopadhyay · Phil. Mag. B · 1985 · 51 · L 3310.1080/13642818508240571 ↗
3. R. Banerjee, D. Das, A.K. Batabyal and A.K. Barua, submitted.
4. D. Adler, presentation at Materials Issues in Applications of Amorphous Silicon Technology (San Francisco, April 15–17, 1985).
5. Tsuge · Technical Digest Int. PVSEC-1 · 1984 · 179
6. Tawada · Appl. Phys. Lett. · 1986 · 48 · 58410.1063/1.96474 ↗
7. Banerjee · J. Appl. Phys. · 1987 · 62 · 91210.1063/1.339699 ↗
8. Müller · Solar Energy Mat. · 1986 · 13 · 38510.1016/0165-1633(86)90086-9 ↗
9. Batabyal · Thin Solid Films · 1984 · 112 · 5110.1016/0040-6090(84)90501-7 ↗
10. Ozturk · Appl. Phys. Lett. · 1984 · 44 · 91610.1063/1.94933 ↗
11. Webb · J. Appl. Phys. · 1983 · 54 · 328210.1063/1.332439 ↗
12. Kumeda · Japan. J. Appl. Phys. · 1986 · 25 · L65410.1143/JJAP.25.L654 ↗