journal article·1997-09

Large area deposition of ITO films by cluster type sputtering system

Keiji Ishibashi, Kazufumi Watabe, Takehiro Sakurai, Osamu Okada, Naokichi Hosokawa

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Surface Roughness and Optical Measurements · Advanced Sensor Technologies Research · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (8)

Show source-provided references
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2. Ishibashi · Thin Solid Films · 1996 · 281&282 · 19810.1016/0040-6090(96)08612-9 ↗
3. Shigesato · Appl. Phys. Lett. · 1992 · 61 · 7310.1063/1.107673 ↗
4. Kitahara · 1991 · 149
5. Song · 1996 · 131
6. Ishibashi · J. Vac. Sci. Technol. · 1992 · A10 · 171810.1116/1.577776 ↗
7. Hoffman · J. Vac. Sci. Technol. · 1990 · A8 · 3703
8. Somekh · J. Vac. Sci. Technol. · 1984 · A2 · 128510.1116/1.572396 ↗