Morphology of LPCVD Si3N4 films after high temperature treatment and HF etching
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Abstract
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Research context
OpenAlex topics: Advanced ceramic materials synthesis · Semiconductor materials and devices · Metal and Thin Film Mechanics
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References (5)
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1. Aleksandrov · Electron. Ind. · 1979 · 30 · 28
2. Beshkov · 1990 · 1162
3. Irene · J. Electrochem. Soc. · 1980 · 251810.1149/1.2129507 ↗
4. Yoshimoto · IEICE Trans. Electronics E75-C · 1992 · 1019
5. Kanicki · IEEE Electron. Device Lett. · 1989 · 10 · 27710.1109/55.31745 ↗