journal article·1993-12

The effect of post-hydrogenation on the equilibrium and metastable properties of hydrogenated amorphous silicon

N.H. Nickel, W.B. Jackson

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies

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References (11)

Show source-provided references
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2. Carlson · Appl. Phys. Lett. · 1978 · 33 · 8110.1063/1.90153 ↗
3. Santos · Phys. Rev. Lett. · 1991 · 67 · 268610.1103/PhysRevLett.67.2686 ↗
4. Beyer · J. Non-cryst. Sol. · 1989 · 114 · 21710.1016/0022-3093(89)90117-8 ↗
5. Mahan · 1991 · Vol. 234 · 195
6. Johnson · Appl. Phys. Lett. · 1991 · 59 · 144310.1063/1.105282 ↗
7. Nickel · 1993
8. R.W. Collins, private communications.
9. Boyce · Phys. Rev. B · 1992 · 46 · 430810.1103/PhysRevB.46.4308 ↗
10. W.B. Jackson unpublished data.
11. Jackson · Phys. Rev. B · 1993 · 47 · 999310.1103/PhysRevB.47.9993 ↗