journal article·1993-12

Electronic mobility gap structure and the nature of deep defects in amorphous silicon-germanium alloys grown by photo-CVD

Thomas Unold, J. David Cohen

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon and Solar Cell Technologies · Semiconductor Quantum Structures and Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (14)

Show source-provided references
1. Aljishi · 1989
2. Chen · Phys. Rev. B · 1991 · 43 · 1169410.1103/PhysRevB.43.11694 ↗
3. Paul · J. Non-Cryst. Solids · 1991 · 137&138 · 80310.1016/S0022-3093(05)80242-X ↗
4. Albright · AIChE Journal · 1990 · 36 · 155510.1002/aic.690361011 ↗
5. Cohen · 1989
6. Cohen · Phys. Rev. B · 1982 · 25 · 532110.1103/PhysRevB.25.5321 ↗
7. Michelson · Appl. Phys. Lett. · 1985 · 47 · 41210.1063/1.96129 ↗
8. Bar-Yam · Phys. Rev. Lett. · 1986 · 57 · 46710.1103/PhysRevLett.57.467 ↗
9. Cohen · J. Non-Cryst. Solids · 1992 · 141 · 14210.1016/S0022-3093(05)80528-9 ↗
10. Unold · J. Non-Cryst. Solids · 1992 · 137&138 · 809
11. Stutzmann · Phil. Mag. B · 1989 · 60 · 53110.1080/13642818908205926 ↗
12. Street · Phil. Mag. · 1987 · B56 · 28910.1080/13642818708221318 ↗
13. Morin · 1992 · 258 · 577
14. T. Unold, to be published.