Theoretical and experimental study of the conduction mechanism in Al/Ta2O5/SiO2/Si and Al/Ta2O5/Si3N4/Si structures
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Semiconductor materials and devices · Advanced ceramic materials synthesis · MXene and MAX Phase Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (18)
Show source-provided references
1. Kaga · J. Vac. Sci. Technol. B · 1995 · 13 · 232910.1116/1.588068 ↗
2. Tang · IEEE Circuits Devices Mag. · 1997 · 13 · 2710.1109/101.589261 ↗
3. Kim · J. Vac. Sci. Technol. B · 1994 · 12 · 300610.1116/1.587550 ↗
4. Autran · IEEE Electron Device Lett. · 1997 · 18 · 44710.1109/55.622525 ↗
5. Chaneliere · Mater. Sci. Eng. R · 1998 · 22 · 26910.1016/S0927-796X(97)00023-5 ↗
6. Kamiyama · J. Electrochem. Soc. · 1993 · 140 · 161710.1149/1.2221612 ↗
7. Kim · Thin Solid Films · 1994 · 253 · 43510.1016/0040-6090(94)90362-X ↗
8. Nishioka · J. Appl. Phys. · 1987 · 61 · 233510.1063/1.337945 ↗
9. Banerjee · J. Appl. Phys. · 1989 · 65 · 114010.1063/1.343052 ↗
10. Chaneliere · J. Appl. Phys. · 1998 · 83 · 482310.1063/1.367277 ↗
11. Devine · Microelectron. Eng. · 1997 · 36 · 6110.1016/S0167-9317(97)00015-4 ↗
12. Frohman-Bentchkowsky · J. Appl. Phys. · 1969 · 40 · 330710.1063/1.1658181 ↗
13. Simmons · Phys. Rev. · 1967 · 155 · 65710.1103/PhysRev.155.657 ↗
14. Yeargan · J. Appl. Phys. · 1968 · 39 · 560010.1063/1.1656022 ↗
15. Sze · J. Appl. Phys. · 1967 · 38 · 295110.1063/1.1710030 ↗
16. Ezhilvalavan · J. Appl. Phys. · 1998 · 83 · 479710.1063/1.367272 ↗
17. Chiu · J. Appl. Phys. · 1997 · 81 · 691110.1063/1.365252 ↗
18. Lundström · IEEE Trans. Electron Devices · 1972 · 19 · 82610.1109/T-ED.1972.17500 ↗