Effects of substrate bias on structure and properties of a-Si:H films deposited by ECR microwave plasmas

journal article·1987-12

T.V. Herak, T.T. Chau, S.R. Mejia, P.K. Shufflebotham, J.J. Schellenberg, H.C. Card, K.C. Kao, R.D. McLeod

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OpenAlex topics: Thin-Film Transistor Technologies · ZnO doping and properties · Copper Interconnects and Reliability

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1. Mejia · J. Non-Cryst. Solids · 1985 · 77&78 · 76510.1016/0022-3093(85)90772-0 ↗

2. Watanabe · Jap. J. Appl. Phys. · 1986 · 25 · 180510.1143/JJAP.25.1805 ↗

3. Drevillon · Appl. Phys. Lett. · 1983 · 42 · 80110.1063/1.94100 ↗

4. Drevillon · Thin Solid Films · 1985 · 124 · 21710.1016/0040-6090(85)90268-8 ↗

5. Coburn · J. Appl. Phys. · 1972 · 43 · 496510.1063/1.1661054 ↗