journal article·2006-07

Modification of vacuum-ultraviolet absorption of SiOH groups in SiO2 glass with temperature, F2 laser irradiation, and H–D isotope exchange

Koichi Kajihara, Masahiro Hirano, Linards Skuja, Hideo Hosono

Journal of Non-Crystalline Solids· Volume 352· Issue 23-25
Publisher page

Abstract

Abstract Variations of vacuum-ultraviolet (VUV) absorption of silanol (SiOH) groups in synthetic wet SiO 2 glass with temperature, exposure to F 2 laser light, and with H–D isotope exchange were examined at photon energies below 8 eV. The intensity of the VUV absorption band decreases with cooling or with exposure to F 2 laser light. The spectral changes in both cases are qualitatively similar and are attributed to an alternation of the bonding configuration of SiOH groups from isolated into hydrogen-bonded states. However, the resultant states are distinctly different: the hydrogen-bonded state formed on cooling is restored reversibly to the isolated state on heating, while that induced by F 2 laser light is metastable and does not decay below 300 °C. The VUV absorption is also reduced by replacing SiOH groups with SiOD groups due to the decrease of the zero-point energy of the ground state associated with OH groups.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Glass properties and applications · Laser Material Processing Techniques · Luminescence Properties of Advanced Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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