journal article·1991

Studies of the deposition of high quality N-rich amorphous silicon nitride films

Z. Yin, F.W. Smith

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (10)

Show source-provided references
1. Lustig · J. Appl. Phys. · 1989 · 65 · 395110.1063/1.343361 ↗
2. Yin · J. Non-Cryst. Solids · 1989 · 114 · 48910.1016/0022-3093(89)90626-1 ↗
3. Phys. Rev. B · 1990 · 42 · 366610.1103/PhysRevB.42.3666 ↗
4. Yin · Phys. Rev. B · 1991 · 43 · 450710.1103/PhysRevB.43.4507 ↗
5. J. Vac. Sci. Technol. A · 1991 · 9 · 97210.1116/1.577558 ↗
6. Robertson · Phil. Mag. B · 1991 · 63 · 4710.1080/01418639108224430 ↗
7. Yin · Phys. Rev. B · 1990 · 42 · 365810.1103/PhysRevB.42.3658 ↗
8. Hasegawa · Appl. Phys. Lett. · 1991 · 58 · 74110.1063/1.104533 ↗
9. Stewart · Phil. Mag. B · 1988 · 57 · 43110.1080/13642818808208515 ↗
10. J. Robertson (private communication).