Energetic particle fluxes in magnetron sputter deposition of a-Si:H
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Abstract
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Research context
OpenAlex topics: Ion-surface interactions and analysis · Metal and Thin Film Mechanics · Plasma Diagnostics and Applications
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References (9)
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1. Growth and Properties of Highly Photosensitive Amorphous Silicon-Carbon Alloys by Reactive Magnetron Sputtering
2. Thornton · J. Vac. Sci. Tech. · 1986 · A4 · 305910.1116/1.573628 ↗
3. Gallagher · J. Appl. Phys. · 1988 · 63 · 240610.1063/1.341034 ↗
4. Yehoda · J. Vac. Sci. Tech. · 1988 · A8 · 163110.1116/1.575341 ↗
5. Energy Resolved Mass Spectrometry of the a-Si:D Film Growth Species During DC Magnetron Sputtering
6. Myers · J. Vac. Sci. Tech. · 1991 · A9 · 61410.1116/1.577375 ↗
7. Silicon Epitaxy at 230°C by Reactive DC Magnetron Sputtering and its In-situ Ellipsometry Monitoring
8. In-situ Measurements of the Hydrogen Flux, Surface Coverage, Incorporation and Desorption During Magnetron Sputter-Deposition of a-Si:H
9. Characterization of the Growth Flux During the Deposition of Hydrogenated Amorphous Silicon by DC Magnetron Reactive Sputtering