journal article·1998-05

Colour separation in a-Si:H based p-i-i-n sensors: temperature and intensity dependence

T Neidlinger, R Brüggemann, H Brummack, M.B Schubert

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Abstract

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OpenAlex topics: Thin-Film Transistor Technologies · CCD and CMOS Imaging Sensors · Transition Metal Oxide Nanomaterials

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References (8)

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3. T. Neidlinger, M.B. Schubert, G. Schmid, H. Brummack, in: M. Hack, E.A. Schiff, S. Wagner, R. Schropp, A. Matsuda (Eds.), Amorphous Silicon Technology—1996, Materials Research Society, Pittsburgh, 1996, pp. 147–152.
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7. Hoheisel · J. Non-Cryst. Solids · 1991 · 137–138 · 118110.1016/S0022-3093(05)80334-5 ↗
8. Weiser · J. Non-Cryst. Solids · 1989 · 114 · 29810.1016/0022-3093(89)90143-9 ↗