journal article·1985-12

A study of electronic states in a-SiOx and a-SiNx thin films by infrared, auger electron and X-ray photoelectron spectroscopies

S.S. Chao, G. Lucovsky, S.Y. Lin, C.K. Wong, P.D. Richard, D.V. Tsu, Y. Takagi, J.E. Keem, J.E. Tyler, P. Pai

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Abstract

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Research context

OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Ga2O3 and related materials · Advanced Electron Microscopy Techniques and Applications

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References (8)

Show source-provided references
1. Philipp · J. Non-Cryst. Solids · 1972 · 8–10 · 62710.1016/0022-3093(72)90202-5 ↗
2. Hollinger · 1980 · 87
3. Ramaker · 1978 · 99
4. S.S. Chao, Y. Takagi, G. Lucovsky, P. Pai, R.C. Custer, J.E. Tyler and J.E. Keem, Applications of Surface Sci. (in press).
5. Richard · J. Vac. Sci. Tech. A · 1985 · 3 · 86710.1116/1.573334 ↗
6. Asaad · 1958 · 72 · 369
7. Shirley · Phys. Rev. A · 1973 · 7 · 152010.1103/PhysRevA.7.1520 ↗
8. Lucovsky · J. Vac. Sci. Tech. B · 1985 · 3 · 112210.1116/1.583066 ↗