journal article·1985-12

Photosensitive amorphous silicon films deposited from hexafluorodisilane

H Koinuma, T Manako, H Natsuaki, H Fujioka, K Fueki

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Advanced Surface Polishing Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (3)

Show source-provided references
1. Sato · Appl. Phys. Lett. · 1984 · 45 · 132410.1063/1.95108 ↗
2. A. Matsuda, et al., Jpn. J. Appl. Phys. 23, L 57610.1143/JJAP.23.L576 ↗
3. Koinuma · Tech. Digest of Int'l PVSEC-1 (Kobe, Japan) · 1984 · 743