Conduction properties and microstructure of metal/SiO cermet thin films produced by recoil atom implantation
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Semiconductor materials and devices · Copper Interconnects and Reliability · Semiconductor materials and interfaces
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (16)
Show source-provided references
1. Large · J. Mater. Sci. · 1967 · 2 · 58910.1007/BF00752224 ↗
2. Mayer · 1969 · Vol. 1 · 239
3. Perkins · 1970 · 323
4. Perkins · Thin Solid Films · 1970 · 5 · R 5910.1016/0040-6090(70)90120-3 ↗
5. Perkins · UKAEA, AWRE Report 09/70 · 1970
6. P. T. Stroud and J. G. Perkins, to be published.
7. Sigmund · Phys. Rev. · 1969 · 184 · 38310.1103/PhysRev.184.383 ↗
8. Johnson · 1969
9. Stroud · 1970 · 116
10. Chou · J. Appl. Phys. · 1970 · 41 · 173110.1063/1.1659098 ↗
11. Balarin · Thin Solid Films · 1969 · 4 · 25510.1016/0040-6090(69)90071-6 ↗
12. Takamura · Thin Solid Films · 1970 · 6 · R1710.1016/0040-6090(70)90023-4 ↗
13. Neugebauer · 1970 · 331
14. Darmois · J. Phys. Radium · 1956 · 17 · 21010.1051/jphysrad:01956001703021000 ↗
15. Hill · Phil. Mag. · 1971 · 23 · 5910.1080/14786437108216365 ↗
16. Frenkel · Phys. Rev. · 1938 · 54 · 64710.1103/PhysRev.54.647 ↗