Control of bonded-hydrogen in plasma-deposited silicon nitrides: Combined plasma-assisted deposition and rapid thermal annealing for the formation of device-quality nitride layers for applications in multilayer dielectrics
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OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence
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References (8)
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6. Lucovsky · 1993 · 284 · 34
7. Robertson · Philos. Mag. · 1991 · B63 · 4710.1080/01418639108224430 ↗
8. Lucovsky · Mater. Res. Soc. Spring MRS · 1994