journal article·1991

High quality a-Si:H films and interfaces prepared by VHF plasma CVD

Shunri Oda, Masahiro Yasukawa

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Surface Roughness and Optical Measurements

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (8)

Show source-provided references
1. Curtins · 1987 · 95 · 249
2. Oda · 1988 · 118 · 117
3. Chatham · 1989
4. Oda · Jpn. J. Appl. Phys. · 1989 · 28 · L186010.1143/JJAP.28.L1860 ↗
5. Oda · Jpn. J. Appl. Phys. · 1990 · 29 · 188910.1143/JJAP.29.1889 ↗
6. Yasukawa · 1991 · 277
7. Ernie · 1991 · 437
8. Graves · 1991 · 433