journal article·1989-12

Ultrafast recombination and trapping in amorphous silicon

A Esser, K Seibert, H Kurz, G.N Parsons, C Wang, B.N Davidson, G Lucovsky, R.J Nemanich

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Laser Material Processing Techniques · Advanced Surface Polishing Techniques

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References (10)

Show source-provided references
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4. Tanguy · Appl. Phys. Lett. · 1988 · 53 · 88010.1063/1.100102 ↗
5. Rehm · Phys. Status Solidi · 1979 · B94 · 695
6. Street · Phys. Rev. · 1981 · B23 · 881
7. Knox · Optics Lett. · 1984 · 9 · 55210.1364/OL.9.000552 ↗
8. Rudder · Appl. Phys. Lett. · 1984 · 45 · 88710.1063/1.95402 ↗
9. A. Esser, K. Seibert, H. Kurz, G. N. Parsons, C. Wang, B. Davidson, G. Lucovsky, and R. J. Nemanich, in print.
10. Downer · Phys. Rev. Lett. · 1986 · 56 · 76110.1103/PhysRevLett.56.761 ↗