The post-hydrogenation of low-pressure chemical vapor deposited amorphous silicon
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Thin-Film Transistor Technologies · Ion-surface interactions and analysis · Glass properties and applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (13)
Show source-provided references
1. Le Comber · Phys. Rev. Lett. · 1970 · 25 · 50910.1103/PhysRevLett.25.509 ↗
2. Carlson · Appl. Phys. Lett. · 1976 · 28 · 67110.1063/1.88617 ↗
3. Chittik · J. Electrochem. Soc. · 1969 · 116 · 7710.1149/1.2411779 ↗
4. Brodsky · Thin Solid Films · 1978 · 50 · 5710.1016/0040-6090(78)90092-5 ↗
5. Rosler · Solid State Techn. · 1977 · 20 · 6310.1016/0022-4596(77)90051-2 ↗
6. Magee · Solar Cells · 1980 · 2 · 36510.1016/0379-6787(80)90012-5 ↗
7. Clark · Appl. Phys. Lett. · 1977 · 31 · 58210.1063/1.89787 ↗
8. Magee · J. Vac. Sci. Technol. · 1981 · 19 · 4710.1116/1.571015 ↗
9. E.F. Steigmeier and H. Auderset, private communication.
10. Sol · J. Non-Crystalline Solids · 1980 · 35–36 · 29110.1016/0022-3093(80)90609-2 ↗
11. Carlson · Appl. Phys. Lett. · 1978 · 33 · 8110.1063/1.90153 ↗
12. Willoughby · Rep. Progr. Phys. · 1978 · 41 · 166510.1088/0034-4885/41/10/003 ↗
13. Pankove · Appl. Phys. Lett. · 1979 · 34 · 15610.1063/1.90711 ↗