Si3N4 thickness and its oxidation time influence on O/N/O DRAM cell performance
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Abstract
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Research context
OpenAlex topics: Semiconductor materials and devices · Advancements in Semiconductor Devices and Circuit Design · Anodic Oxide Films and Nanostructures
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References (13)
Show source-provided references
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13. Trolier-McKinstry · J. Electrochem. Soc. · 1994 · 141 · 248310.1149/1.2055147 ↗