Electric field assisted dissolution of metal films on coated soda-lime glass

The process of glass poling and electric field assisted dissolution of metal films on coated glass substrates is investigated. The samples consist of soda lime glass substrates coated with thin dielectric layers of different materials (SiO2, Al2O3, TiO2) and an Ag film. The samples are subjected to the application of dc voltage at 200 °C. As a result, the metal film is dissolved and partially incorporated in the dielectric layer and glass substrate. It is shown that during the pre-heating process prior to the voltage application ions from the metal film and alkali ions from the glass substrate incorporate into the dielectric layer. The field-assisted dissolution, characterized by glass poling and drift of metal film ions into the dielectric layer and glass substrate, appears to strongly depend on the dielectric layer material and its ion incorporation during pre-heating. The process dynamics is corroborated by numerical simulations of ion drift and diffusion and compared to electrical current measurements. Overall, it turns out that the optical properties of the metal-doped dielectric layers can be varied in a complex manner by the described process, broadening the potential of glass poling and electric field assisted dissolution in photonics applications.