journal article·1989-12

Low temperature selective crystallization of amorphous silicon

R. Kakkad, G. Liu, S.J. Fonash

Journal of Non-Crystalline Solids· Volume 115· Issue 1-3
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (4)

Show source-provided references
1. Kakkad · J. Appl. Phys. · 1989 · 65 · 206910.1063/1.342851 ↗
2. Liu · Applied Phys. Letters · 1989 · 55 · 66010.1063/1.101814 ↗
3. Zanzucchi · J. Appl. phys. · 1977 · 48 · 527710.1063/1.323553 ↗
4. Chelikowsky · Phys. Rev. B · 1976 · 14 · 55610.1103/PhysRevB.14.556 ↗